Grade: CG-1032F
1H,1H,2H,2H-Perfluorodecyltriethoxysilane
CG-1032F (1H,1H,2H,2H-Perfluorodecyltriethoxysilane) provides water and oil repellency and anti-reflective properties. It is suitable for waterproof, anti-fouling, self-cleaning, and hydrophobic/oleophobic treatments on surfaces such as glass, ceramics, granite, tiles, natural stone, and wood-plastic composites. It is also used for anti-fouling coatings on building materials and electronic products, as an additive in sol-gel systems, for the synthesis of fluorosilicone resins, for surface coating of pigments in cosmetics, and in chemical vapor deposition (CVD).
- CAS No.: 101947-16-4
- EC No.: N.A.
- Molecular Formula: C16H19F17O3Si
- Structural Formula
- Synonyms: Triethoxy-1H,1H,2H,2H-perfluorodecylsilane
- Appearance: colorless, transparent liquid
- Purity: ≥98%
- Density (25 °C): 1.389±0.010 g/cm3
Packaging and Storage
This product can be packaged in 25 kg plastic drums, 200 kg plastic drums, or steel drums. Other package sizes are available upon request. Store in a cool, well-ventilated, dry place in tightly sealed containers, protected from light. Keep away from moisture and sources of ignition. Ensure the lid is tightly sealed and effectively isolates the product from air; moisture in the air can react quickly, thereby leading to hydrolysis and polymerization. Shelf life in the original unopened packaging is one year. This product is irritating to skin and eyes. If it contacts skin, wash with soap. If it contacts eyes, rinse immediately with plenty of water.
Application
CG-1032F provides water and oil repellency and anti-reflective properties. It is suitable for waterproof, anti-fouling, self-cleaning, and hydrophobic/oleophobic treatments on surfaces such as glass, ceramics, granite, tiles, natural stone, and wood-plastic composites. It is also used for anti-fouling coatings on building materials and electronic products, as an additive in sol-gel systems, for the synthesis of fluorosilicone resins, for surface coating of pigments in cosmetics, and in chemical vapor deposition (CVD).
